Cluster Configuration for plasma etching & deposition High throughput Plasma Etching and deposition Options: PECVD ICPECVD Atomic Layer Deposition modules can be combined with up to two cassette stations for high throughput processing of up to 200 mm wafers.
Oxford Instruments Plasma Lab 100 PECVD Oxford Instruments Plasma Lab 100 PECVD. This is a load locked PECVD system capable of depositing SiO2, Si3N4 and a-Si. Process temperatures range from room temperature through 400C. In addition to standard RF plasma, there is a low frequency source for stress tuning films. The system handles 4"/100mm
MSP, a Division of TSI, is an instrument and equipment company that creates products for scientific research and industrial applications. We are known world-wide for our expertise in micro- and nanoparticles and their creative use in research and manufacturing.
Excel Instruments Excel Instuments, founded in 1996, is India's leading manufacturer of custom designed vacuum system and components. We can work with you understanding your needs and budgetary constraints, designing systems to suit your research and budget so that you can concentrate on your research and let us worry about the hardware.
The PECVD is the left chamber of the two-chamber unit. It has 4 gas channels, one purge line, and a 13.56 MHz RF power source capable of delivering 500 watts. The system is computer controlled, and users can select and run recipes.
2019129Description: This Oxford Plasmalab System 100 is a Plasma Enhanced Chemical Vapor Deposition (PECVD) system. It is used to deposit low-stress thin films with excellent step coverage on a variety of samples at low temperatures (generally 200 - 300 O C).
PECVD (plasma enhanced chemical vapour deposition) by ICP (inductively coupled plasma) of SiO 2, Si 3 N 4 and amorphous Si.Carrier gas like O 2, N 2 or Ar is let in to the ICP reactor. The ICP makes the plasma denser than ordinary PECVD and makes the dissociation of more effective, allowing lower deposition temperatures.
A wide variety of pecvd equipment options are available to you, There are 841 pecvd equipment suppliers, mainly located in Asia. The top supplying countries or regions are China, South Korea, and Russian Federation, which supply 99%, 1%, and 1% of pecvd equipment respectively.
Zhengzhou CY Scientific Instrument Co., Ltd is a high and new technology enterprise registered in Zhengzhou city of Henan province, mainly engaged in the research and development, design, manufacturing and sales of equipment used in scientific researches. Independence and innovation is the company's tenet.
Depolab 200 plasma enhanced chemical vapour deposition tool is configured to deposit SiO 2, SiN x, SiON x, and a-Si films in a temperature range up to 400 °C. The PECVD Depolab 200 is especially suited for the deposition of dielectric films for etching masks, membranes, electrically isolating films, and others.
ALD HfO2 ALD Al2O3 PECVD Si3N4 / nt m 2) Capacitor Dielectric Capacitance DensityDielectric Constant ALD HfO2 ALD Al2O3 PECVD Si3N4 Figure 3. Capacitance density of MIM capacitor with, and dielectric constant of 59 nm ALD HfO 2, 62 nm ALD Al 2 O 3, and 63 nm PECVD Si 3 N 4. Since most GaAs devices may be operating at varying
The SI 500 D plasma deposition tool represents the leading-edge for plasma enhanced chemical vapor deposition of dielectric films, a-Si, SiC, and other materials. It is based on PTSA plasma source, separated gas inlets for reaction gasses, dynamic temperature controlled substrate electrode, fully controlled vacuum system, advanced SENTECH control software using remote field bus technology, and